1. IR Laser Release for 3D Stacked Devices: Effect of the Release Stack Structure on the Debonding Mechanism
François Chancerel — imec
Peter Urban — EV Group, Inc.
John Slabbekoorn — imec
Steven Brems — imec
Julian Bravin — EV Group, Inc.
Alain Phommahaxay — imec
Thomas Uhrmann — EV Group, Inc.
Markus Wimplinger — EV Group, Inc.
Eric Beyne — imec
2. High Performance 3D Package Technology for Mobile Application Processor (AP)
Sun Jae Kim — Samsung Electronics Co., Ltd.
Cheol Kim — Samsung Electronics Co., Ltd.
Huiyeong Jang — Samsung Electronics Co., Ltd.
Jongpa Hong — Samsung Electronics Co., Ltd.
Seongyo Kim — Samsung Electronics Co., Ltd.
Yongwon Choi — Samsung Electronics Co., Ltd.
Chajea Jo — Samsung Electronics Co., Ltd.
Sun-Kyung Seo — Samsung Electronics Co., Ltd.
Dong Kwan Kim — Samsung Electronics Co., Ltd.
Dae-Woo Kim — Samsung Electronics Co., Ltd.
3. Advancements in Photonic Debonding: Processing Silicon-Based Power Devices
Vahid Akhavan — PulseForge, Inc.
Vikram Turkani — PulseForge, Inc.
Rajesh Rao — Applied Novel Devices
Vishal Trivedi — Applied Novel Devices
Leo Mathew — Applied Novel Devices
Andy Jones — Brewer Science, Inc.
Nathan Parker — Brewer Science, Inc.
Seth Molenhour — Brewer Science, Inc.
Luke Prenger — Brewer Science, Inc.
Harry Chou — PulseForge, Inc.
Rudy Ghosh — PulseForge, Inc.
Boone Munson — PulseForge, Inc.
4. Bump-Less Interconnect With Room Temperature Pre-Bondable Adhesive and Solder for High Throughput Chip Stacking
Wataru Okada — Mitsui Chemicals, Inc.
Yuzo Nakamura — Mitsui Chemicals, Inc.
Yasuhisa Kayaba — Mitsui Chemicals, Inc.
Takuo Shikama — Mitsui Chemicals, Inc.
Yutaka Hisamune — Mitsui Chemicals, Inc.
Kahori Tamura — Mitsui Chemicals, Inc.
Satoshi Inada — Mitsui Chemicals, Inc.
Rikia Furusho — Mitsui Chemicals, Inc.
5. IR Laser Debond From Silicon Carrier Wafers With Inorganic Thin Films for High-Density 2.5D and 3D Integration
Thomas Sounart — Intel Corporation
Tushar Talukdar — Intel Corporation
Henning Braunisch — Intel Corporation
Paul Nordeen — Intel Corporation
Kimin Jun — Intel Corporation
Aleksandar Aleksov — Intel Corporation
Adel Elsherbini — Intel Corporation
Shawna Liff — Intel Corporation
Johanna Swan — Intel Corporation
6. Backside Thinning Process Development for High-Density TSV in a 3-Layers Integration
Renan Bouis — Grenoble Alps University/CEA-LETI
Lionel Vignoud — Grenoble Alps University/CEA-LETI
Jerome Dechamp — Grenoble Alps University/CEA-LETI
Damien Hebras — Grenoble Alps University/CEA-LETI
Paul Valentin — Grenoble Alps University/CEA-LETI
Jeremy Marchand — Grenoble Alps University/CEA-LETI
Stephan Borel — Grenoble Alps University/CEA-LETI
Myriam Assous — CEA-LETI
7. Process Development and Characterization of Ru-Based UBM for In Bumps Interconnects Integration for Quantum Assemblies
Harold Le Tulzo — Technic France
Diane Bijou — Technic France
Thérèse Souza — Technic France
Anthony Gallegos — Technic France
Candice Thomas — CEA-LETI
Edouard Deschaseaux — CEA-LETI
Céline Feautrier — CEA-LETI
Jean Charbonnier — CEA-LETI
Alain Gueugnot — CEA-LETI
Jaber Derakhshandeh — imec
Tassawar Hussain — imec
Jérôme Daviot — Technic France